Borophosphosilicate glass thin films in electronics / Vladislav Yu. Vasilyev.
2013
TK7871.15.S55
Formats
Format | |
---|---|
BibTeX | |
MARCXML | |
TextMARC | |
MARC | |
DublinCore | |
EndNote | |
NLM | |
RefWorks | |
RIS |
Linked e-resources
Details
Title
Borophosphosilicate glass thin films in electronics / Vladislav Yu. Vasilyev.
Uniform Title
Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoæi mikroçelektroniki. English
ISBN
9781626180345 (ebook)
9781624179594 (hardcover)
1624179592
1626180342 (electronic bk.)
9781626180345 (electronic bk.)
9781624179594 (hardcover)
1624179592
1626180342 (electronic bk.)
9781626180345 (electronic bk.)
Published
New York : Nova Science Publishers, [2013]
Language
English
Language Note
Text in English.
Description
1 online resource.
Call Number
TK7871.15.S55
System Control No.
(OCoLC)854583694
Note
Translation of: Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoĭ mikroėlektroniki.
Bibliography, etc. Note
Includes bibliographical references (pages 221-234) and index.
Formatted Contents Note
BOROPHOSPHOSILICATE GLASS THIN FILMS IN ELECTRONICS ; Library of Congress Cataloging-in-Publication Data ; CONTENTS ; PREFACE ; LIST OF ABBREVIATIONS (IN ORDER OF APPEARANCE) ; LIST OF IMPORTANT SYMBOLS (IN ORDER OF APPEARANCE); INTRODUCTION ; PART 1. BPSG THIN FILM DEPOSITION; Chapter 1 BRIEF HISTORICAL OVERVIEW OF BPSG THIN FILM RESEARCH ; Chapter 2 BASIC BPSG FILM CVD TOOLS AND METHODOLOGY ; 2.1. CVD PROCESS COMPOUNDS ; 2.2. BASIC CVD TOOL DESIGN FOR SILICON DIOXIDE AND GLASS FILM DEPOSITION ; 2.3. SOME BASIC THIN FILM CVD PROCESS PARAMETERS.
Chapter 3 BASIC BPSG CVD KINETIC FEATURES 3.1. BASIC THIN FILM CVD KINETIC FEATURES ; 3.2. BASIC SILICON DIOXIDE THIN FILM CVD KINETIC FEATURES ; 3.3. BASIC SILICATE GLASS THIN FILM CVD KINETIC FEATURES ; 3.4. BASIC AEROSOL FORMATION FEATURES AT GLASS CVD ; Chapter 4 AS-DEPOSITED BPSG FILM STEP COVERAGE AND GAP-FILL ; 4.1. BASIC DEFINITIONS OF STEPPED DEVICE STRUCTURES ; 4.2. BASIC DEFINITIONS FOR THIN FILM CVD ON STEPPED DEVICE STRUCTURES ; 4.3. CHARACTERIZATION OF CVD PROCESSES ON STEPPED STRUCTURES ; 4.4. IMPROVEMENT OF GLASS FILM CVD ON STEPPED STRUCTURES.
Chapter 5 GLASS FILM CVD SCHEMES 5.1. GENERAL THIN FILM CVD PROCESS SCHEME ; 5.2. CVD THIN FILM DEPOSITION PROCESSES CLASSIFICATION ; 5.3. THIN FILM SIO AND SILICATE GLASS DEPOSITION PROCESSES SCHEMES 2; Chapter 6 BPSG FILM INDUSTRIAL CVD TECHNOLOGY ; FINAL REMARKS ON PART 1 ; PART 2. BPSG FILM COMPOSITION, STRUCTURE, AND PROPERTIES ; Chapter 7 BRIEF REVIEW ON BPSG THIN FILM ANALYSIS TECHNIQUES ; 7.1. ANALYTICAL METHODS OVERVIEW ; 7.2. FTIR METHOD IMPLEMENTATION BPSG FILM COMPOSITION ANALYSIS ; 7.3. LASER SCANNING METHOD ; 7.4. MICROSCOPY METHODS.
7.5. TOTAL CHARGE MAPPING METHODS 7.6. SECONDARY ION MASS SPECTROMETRY METHOD ; Chapter 8 BPSG FILM COMPOSITION ; Chapter 9 BPSG FILM STRUCTURE ; 9.1. BRIEF REVIEW OF SILICA STRUCTURE: BASICS AND TERMS ; 9.2. BRIEF REVIEW OF BORON OXIDE AND PHOSPHORUS OXIDE STRUCTURES ; 9.3. BPSG COMPOSITION AND STRUCTURE ; 9.4. DIFFERENCES IN BPSG COMPOSITION AND STRUCTURE ; Chapter 10 BASIC BPSG FILM PROPERTIES ; 10.1. SURFACE MORPHOLOGY OF THIN GLASS FILMS ; 10.2. FILM MECHANICAL STRESS ; 10.3. FILM DENSITY
FILM POROSITY
FILM SHRINKAGE ; 10.4. FILM WET ETCH RATE.
10.5. GETTERING PROPERTIES OF BPSG FILMS10.6. ELECTRICAL PROPERTIES OF BPSG FILMS ; 10.7. SUMMARIES OF BPSG FILM PROPERTIES FOR PRODUCTION PROCESSES ; Chapter 11 BPSG FILM FLOW CAPABILITY ; 11.1. BRIEF DESCRIPTION OF GLASS FLOW BASICS ; 11.2. GLASS STRUCTURE FEATURES AND GLASS FLOW CAPABILITY ; 11.3. APPLICATION OF BULK GLASS PARAMETERS TO GLASS THIN FILM ; Chapter 12 BPSG FILM
AMBIENT MOISTURE INTERACTION ; 12.1. TECHNIQUE FOR ANALYSIS OF MOISTURE EFFECTS IN THIN GLASS FILMS ; 12.2. FILM-MOISTURE INTERACTION ; 12.3. DESCRIPTION OF MOISTURE ABSORPTION EFFECTS IN BPSG FILMS.
Chapter 3 BASIC BPSG CVD KINETIC FEATURES 3.1. BASIC THIN FILM CVD KINETIC FEATURES ; 3.2. BASIC SILICON DIOXIDE THIN FILM CVD KINETIC FEATURES ; 3.3. BASIC SILICATE GLASS THIN FILM CVD KINETIC FEATURES ; 3.4. BASIC AEROSOL FORMATION FEATURES AT GLASS CVD ; Chapter 4 AS-DEPOSITED BPSG FILM STEP COVERAGE AND GAP-FILL ; 4.1. BASIC DEFINITIONS OF STEPPED DEVICE STRUCTURES ; 4.2. BASIC DEFINITIONS FOR THIN FILM CVD ON STEPPED DEVICE STRUCTURES ; 4.3. CHARACTERIZATION OF CVD PROCESSES ON STEPPED STRUCTURES ; 4.4. IMPROVEMENT OF GLASS FILM CVD ON STEPPED STRUCTURES.
Chapter 5 GLASS FILM CVD SCHEMES 5.1. GENERAL THIN FILM CVD PROCESS SCHEME ; 5.2. CVD THIN FILM DEPOSITION PROCESSES CLASSIFICATION ; 5.3. THIN FILM SIO AND SILICATE GLASS DEPOSITION PROCESSES SCHEMES 2; Chapter 6 BPSG FILM INDUSTRIAL CVD TECHNOLOGY ; FINAL REMARKS ON PART 1 ; PART 2. BPSG FILM COMPOSITION, STRUCTURE, AND PROPERTIES ; Chapter 7 BRIEF REVIEW ON BPSG THIN FILM ANALYSIS TECHNIQUES ; 7.1. ANALYTICAL METHODS OVERVIEW ; 7.2. FTIR METHOD IMPLEMENTATION BPSG FILM COMPOSITION ANALYSIS ; 7.3. LASER SCANNING METHOD ; 7.4. MICROSCOPY METHODS.
7.5. TOTAL CHARGE MAPPING METHODS 7.6. SECONDARY ION MASS SPECTROMETRY METHOD ; Chapter 8 BPSG FILM COMPOSITION ; Chapter 9 BPSG FILM STRUCTURE ; 9.1. BRIEF REVIEW OF SILICA STRUCTURE: BASICS AND TERMS ; 9.2. BRIEF REVIEW OF BORON OXIDE AND PHOSPHORUS OXIDE STRUCTURES ; 9.3. BPSG COMPOSITION AND STRUCTURE ; 9.4. DIFFERENCES IN BPSG COMPOSITION AND STRUCTURE ; Chapter 10 BASIC BPSG FILM PROPERTIES ; 10.1. SURFACE MORPHOLOGY OF THIN GLASS FILMS ; 10.2. FILM MECHANICAL STRESS ; 10.3. FILM DENSITY
FILM POROSITY
FILM SHRINKAGE ; 10.4. FILM WET ETCH RATE.
10.5. GETTERING PROPERTIES OF BPSG FILMS10.6. ELECTRICAL PROPERTIES OF BPSG FILMS ; 10.7. SUMMARIES OF BPSG FILM PROPERTIES FOR PRODUCTION PROCESSES ; Chapter 11 BPSG FILM FLOW CAPABILITY ; 11.1. BRIEF DESCRIPTION OF GLASS FLOW BASICS ; 11.2. GLASS STRUCTURE FEATURES AND GLASS FLOW CAPABILITY ; 11.3. APPLICATION OF BULK GLASS PARAMETERS TO GLASS THIN FILM ; Chapter 12 BPSG FILM
AMBIENT MOISTURE INTERACTION ; 12.1. TECHNIQUE FOR ANALYSIS OF MOISTURE EFFECTS IN THIN GLASS FILMS ; 12.2. FILM-MOISTURE INTERACTION ; 12.3. DESCRIPTION OF MOISTURE ABSORPTION EFFECTS IN BPSG FILMS.
Source of Description
Description based on print version record and CIP data provided by publisher.
Added Author
Series
Electronics and telecommunications research
Materials science and technologies series.
Materials science and technologies series.
Available in Other Form
Print version: Borophosphosilicate glass thin films in electronics New York : Nova Science Publishers, Inc., [2013]
Linked Resources
Record Appears in